Our facilities also include:

• Structural characterisation of materials (X-ray and electron diffraction, IR spectroscopy, AFM/STM)
• Non-linear optical measurements
• Thin film deposition (spinning, thermal evaporation, electrochemical deposition, Langmuir-Blodgett technique, self-assembly)
• Thin film patterning technology (photolithography, chemical etching, plasma processing)
• Semiconductor device processing (full clean room facilities)
• Semiconductor and semiconductor device modelling
• Sensor measurements (gas, vapour and liquid)
• Software development